Boron Nitride Crucible Boron Nitride Ceramic Crucible Square | NEXACULE

Boron Nitride Crucible Description:

• Type:Boron Nitride Crucible
• Purity: 99%
• Operating temperature:2000 ° C (inert environment)   1800 ° C (vacuum environment)    900 ° C (in air)
• Quantity:If there are need more quantites, get wholesale price please contact us.E-mail us at info@nexacule.com
• Customize:If you need others size,we can customize as your size.E-mail us at info@nexacule.com
• Import duties or taxes are not included in the item price or shipping charges. These charges are the buyer's responsibility.

Boron Nitride Crucibles Feature:

Boron nitride (BN) crucibles are specialized containers used in high-temperature applications, ideal for handling molten metals and other reactive materials. 

• Excellent Thermal Shock Resistance: BN crucibles can withstand rapid temperature changes without cracking or degrading, making them suitable for processes involving rapid heating and cooling cycles.
• High Temperature Stability: BN maintains its structural integrity and chemical stability at very high temperatures, allowing for use with a wide range of molten metals and materials.
• Chemical Inertness: BN is highly resistant to chemical attack from most molten metals, slags, and fluxes, ensuring minimal contamination of the melt and extending crucible lifespan.
• Non-Wetting Properties: Molten metals and materials do not readily adhere to the surface of BN crucibles, facilitating easy removal of solidified materials and simplifying cleaning.
• High Thermal Conductivity: While lower than some other ceramics, BN's thermal conductivity is still sufficient for efficient heat transfer in many high-temperature processes.
• Electrical Insulation: BN is an excellent electrical insulator, preventing unwanted electrical currents and arcing in certain applications.

Boron Nitride Crucibles Applications:

• Molten Metal Handling: Melting and casting of precious metals (gold, silver, platinum), aluminum, copper, and other alloys.
• Chemical Vapor Deposition (CVD): Crucibles for growing crystals and depositing thin films.
• Molecular Beam Epitaxy (MBE): Sources and crucibles for evaporating materials in thin film deposition.
• Metal Evaporation: Used in vacuum metallization processes.
• Single Crystal Growth: Crucibles for growing high-purity single crystals.
• High-Temperature Synthesis: Reactions involving high temperatures and reactive materials.